Kinetics and compositional dependence on the microwave power and DiH4/N flow ratio of silicon nitride deposited by electron cyclotron resonance plasmas

摘要

The archival version of this work was published in Journal of The Electrochemical Society. Hernández, M. J., Garrido, J., Martínez, J. and J. Piqueras. Kinetics and compositional dependence on the microwave power and DiH4/N flow ratio of silicon nitride deposited by electron cyclotron resonance plasmas. Journal of The Electrochemical Society 141.11 (1994): 3234-3237